MUTECH Microsystems

About

MUTECH Microsystems produce a full suite of microfabrication tools aimed at making cutting-edge technology more accessible for education, research and industry. Through expert, considered design, their systems combine powerful, cutting-edge feature sets with ease-of-use, simple maintenance and reliability.

The current product range includes direct laser lithography equipment, mask aligners, spin coaters, and UV exposer tools.

Key features

Advanced feature sets
Compact units for benchtop location
Turnkey for easy setup
User-friendly operation and maintenance
Highly reliable; proven performance
Cleanroom, glovebox and fumehood compatible
High value and fast delivery

Applications

Microelectronics and semiconductors
MEMS
Nanotechnology
Optical and photonic research
Sensors
Microfluidics
Biotechnology

Technologies

Direct laser lithography

Direct laser lithography (DLL) is a high-precision, maskless patterning technique that uses a focused laser beam to directly write micro- and nano-scale structures onto photoresist-coated substrates. Unlike conventional photolithography, DLL doesn’t require a physical mask, offering unmatched flexibility for rapid prototyping and custom designs.

Mask aligners

Mask aligners are precision photolithography tools used to transfer micro-scale patterns from photomasks onto light-sensitive photoresist-coated substrates. They work by aligning a mask and substrate with high accuracy (with the aid of optical microscopy) and exposing them to ultraviolet (UV) light, enabling the creation of intricate microstructures.

UV exposers

UV exposer tools are simple mask exposure devices for photolithography, designed to transfer patterns from a photomask to photoresist-coated substrates using UV light. Unlike more complex systems, these devices are ideal for straightforward, cost-effective patterning tasks in research and production environments.

Spin coating

Spin coating is a widely used deposition technique that involves applying a liquid onto a flat substrate and spinning it at high speed to spread the material evenly by centrifugal force. This produces uniform, controllable film thicknesses. Film properties can be controlled through the process setup.

Products

µLaser

μLaser is a direct laser lithography writer, oriented to universities and research facilities looking to expand their capabilities. It writes on a photosensitive resist coated surface with a 405 nm laser at submicron pixel resolution, over large areas. You can write anything from photomasks to research prototypes. The integrated camera can be used to align writing with existing features.

Confocal camera; yellow light illumination
Typical writing speed: 100–120 mm/s
Maximum writing area: 100 × 92 mm2
Unidirectional positioning step: X = 0.16 µm, Y = 1.00 µm
Raster steps of objectives: Fine 0.8 µm; Medium Fine 0.96 µm; Medium 2 µm; Coarse 5 µm
User-friendly PC software control (PC and software included)
Compact size: 510 (w) × 360 (d) × 455 (h) mm; 16 kg

μAligner

μAligner is a compact UV mask aligner. It allows for easy fabrication of multilayer devices on a multitude of photoresists, with excellent exposure quality. Alignment is using the calibrated digital microscope and the X-Y-R micrometer-based alignment stage. The fully electronic wafer pressure and gap control allows for easy operation and very high repeatability of exposure conditions between processes.

Long-life LED light source; 365 nm wavelength; parallel optics
Large exposure area; 4”/100 mm diameter aperture
Electronic pressure and gap control
Digital microscope; yellow light illumination
Easy-to-use touchscreen control interface
Compact size: 350 (w) × 490 (d) × 470 (h) mm; 19 kg

μExposer

μExposer is an UV exposing system designed for microfabrication applications. It allows the user to perform fast lithography processes on a variety of substrates. The system consists of an UV 365 nm parallel LED light source and a sliding tray to hold the photolithography mask and sample. A variety of customisations, including holders, can be provided for your application.

Long-life LED light source; 365 nm wavelength; parallel optics
Up to 4”/100 mm wafer substrates
User-friendly onboard control
Compact size: 220 (w) × 230 (d) × 320 (h) mm ; 9 kg

μCoater

µCoater is easy to use and full of features for a benchtop spin coater. It includes an integrated vacuum system with a rotating vacuum chuck for holding the substrates to coat while spinning. It has an all-metal body construction with a polypropylene vacuum chuck; the inside of the spinning bowl is coated with a PTFE based material which is easy to clean. µCoater uses a high-quality, efficient outrunner brushless motor with very low static friction — providing a long lifetime.

Integrated vacuum pump
Spin speed: 500 rpm (minimum); 10,000 rpm (maximum)
Maximum acceleration: 5,000 rpm/s
Maximum time per step: 1,000 s
User-friendly onboard control
Compact size: 207 (w) × 307 (d) × 160 (h) mm ; 3 kg (including vacuum pump)